Designed to measure ultra-trace oxygen to the very lowest levels, the DF-560E delivers the semiconductor industry an industry-leading 45ppt Lower Detection Limit (LDL). Flexible and adaptable, the DF-560E is able to monitor O2 in multiple background gases while logging data in a variety of formats.
This device negates the effects of upset prone applications, thanks to Servomex’s high stability Coulometric sensing technology delivering a fast speed of response in the presence of sample and flow rate changes.
Ideal for semiconductor fabs and analytical carts, the DF-560E is optimized for ease of use and portability. Operation is made via the front panel or digital communications, while various hand carry options make it easy to transport. The DF-560E also reduces operational costs through non- depleting, factory calibrated Coulometric technology, providing cost-effective setup and configuration. The only ongoing maintenance requirement is an annual SPAN calibration, with no programmable cell replacement needed.
